Altatech Introduces New CVD System For Thin-Film PV Manufacturing

Posted by SI Staff on October 08, 2012 No Comments
Categories : Products & Technology

Altatech, a subsidiary of Soitec, has launched a multi-chamber chemical vapor deposition (CVD) system designed to enable photovoltaic cell manufacturers to develop and optimize their solar cell designs using advanced thin-film deposition of amorphous silicon and other materials.

By performing all deposition processes within a single system, the new AltaCVD Solarlab tool reduces cycle times and materials consumption in fabricating advanced single-junction, tandem-junction and triple-junction PV cells, according to the company.

Using the AltaCVD Solarlab, customers can deposit transparent conducting oxide films that deliver the optical characteristics, high doping mobility and smooth, defect-free surfaces needed to optimize efficiency of their solar cells. In creating its newest CVD system, Altatech used its patented chamber architecture and deposition technology, which enables the use of new precursor gases to achieve extremely high film uniformity and tightly controlled stoichiometry, the company adds.

Soitec plans to begin shipping AltaCVD Solarlab systems to customers by the end of this year.

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