Beneq, a supplier of atomic layer deposition (ALD) equipment and thin-film coating services, has signed a licensing agreement for Lotus Applied Technology’s Vortex ALD technology and is using it to introduce a new solution.
Beneq says it will be using the technology developed by Lotus in new rotary spatial ALD equipment that provides low process cost and high productivity in industrial ALD applications, such as barrier and protection applications for solar photovoltaics and LED.
According to the company, the new equipment will provide an optimal solution for ALD on wafers in industrial applications and will complement Beneq’s portfolio of large-throughput spatial ALD solutions for industrial use, which already includes roll-to-roll ALD equipment and continuous large-area ALD solutions for moving sheet substrates.
Demo equipment of the new rotary spatial ALD solution is already available and being tested with Beneq industry partners. First deliveries of industrial equipment are expected to take place in 2017.
“High-productivity industrial ALD solutions form a key part of Beneq’s equipment business, and we have big plans for developing our spatial ALD offering further,” says Tommi Vainio, vice president of thin-film equipment at Beneq. “Lotus is a pioneer in optimizing spatial ALD solutions for technically demanding and cost-sensitive thin-film applications. By licensing their Vortex ALD technology, we will shorten the time to market of our next industrial spatial ALD solutions.”