Indium Expands Range For Sputtering Targets

Posted by SI Staff on July 09, 2012 No Comments
Categories : Products & Technology

Indium Corp. has expanded its range of copper indium gallium and copper-gallium rotary sputtering targets. The targets are now available in lengths up to 3.2 meters and thicknesses of the monolithic source layer up to 22 mm.

The targets are made by Indium's proprietary process, which utilizes aerospace powder metallurgy technology. According to the company, the production process output produces a consistently homogeneous alloy with low-PPM contaminate levels and uniform density throughout the target, resulting in consistent sputtering film properties.

The targets are produced as a monolithic material, bonded onto the backing tube during Indium's proprietary hybrid consolidation process.

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