Russian PV Firm Selects Veeco MOCVD System

Posted by SI Staff on February 29, 2008 No Comments
Categories : Products & Technology

Research Production Enterprise (Kvant), Moscow, has ordered a Veeco Instruments Inc. TurboDisc E450 arsenic phosphide (As/P) metal organic chemical vapor deposition (MOCVD) system for the production of multi-junction solar cells.

‘Our decision to add Veeco's MOCVD As/P E450 System to our fab was based on the tool's ability to produce exceptionally high quality films and the throughput advantage of this system, which is key as we continue to increase output of our photovoltaic cells,’ comments Valery Semenov, director of Kvant.

TurboDisc E450 (and its recently introduced successor, the E475) is engineered for the high-volume production of compound semiconductor materials, featuring integrated RealTemp 200 technology for direct closed-loop in-situ wafer temperature control and fast gas-switching for strict control of interface abruptness.

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