General Plasma Inc. (GPI) has completed its acquisition of the Ion Source product line from Advanced Energy Industries Inc., strengthening its portfolio of anode layer ion source technology.
‘This new product line will allow GPI's Advanced Sources division to meet a wider set of customer needs and presents significant opportunities for growth into new markets, particularly in the rapidly growing solar energy segment,’ says John Madocks, president and founder of General Plasma.
‘GPI's experience applying our patented ion sources to substrate etching, cleaning, treatment and deposition processes will assist the ion source customer base,’ he adds.
SOURCE: General Plasma
