Shangguan has a background in low-temperature polysilicon technology, thin-film transistor process technology and chemical vapor deposition process chamber development. He is acknowledged as an originator of remote plasma source cleaning technology and the commercial use of inkjet for color filter technology.
In 1999, R&D Magazine awarded Shangguan the 100 Best Products award for a solution to greenhouse gas reduction during chamber cleaning. In 2007, he was presented with the Hall of Fame patent award for significant, commercially successful innovations. He has been granted over 50 U.S. and international patents and has 40 additional patents pending.
SOURCE: General Plasma Inc.