Austin, Texas-based HelioVolt, a developer of thin-film material for the solar industry, will extend its Cooperative Research and Development Agreement (CRADA) with the Department of Energy's National Renewable Energy Laboratory (NREL) to further research the company's FASST technology.
HelioVolt's FASST's technology is an alternative way to manufacture thin-film CIGS photovoltaics (PV). The company says the process can be used under both vacuum and atmospheric conditions to print PV material directly onto traditional construction materials, including architectural glass, steel, roofing and polymers, in 80 to 98% less time than with conventional processes.
‘Our collaborative efforts with NREL over the years have formed the groundwork for a viable new solar paradigm: large scale production of building materials that are durable, versatile, visually appealing and capable of economically harvesting energy from the sun,’ says B.J. Stanbery, HelioVolt's president and founder.
The company has also recently won the Nano 50 award from Nanotech Briefs for the FASST product. For more information, contact HelioVolt at (512) 767-6000.
